Aging time significantly reduced! Plasma-resistant and corrosion-resistant YOF protective film.
The era has shifted from Y2O3 to YOF! Significantly reduced aging time for etching equipment, decreased particles, greatly increased equipment operating time, and improved productivity!
The YOF film (yttrium fluoride film) produced by the ion-assisted deposition method not only reduces particles and significantly increases equipment operating time as a protective film for dry etching equipment parts, but it can also greatly shorten the aging time that was previously required. In today's world, where semiconductor shortages are a problem, improving yield and increasing equipment operating time are paramount for semiconductor manufacturers. The protective film created by the ion-assisted deposition method, introduced in cutting-edge manufacturing lines, can be used as a protective film for dry etching equipment parts and for regeneration during regular maintenance.
- Company：つばさ真空理研 横浜ラボラトリー
- Price：Other
